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Brand Name : SHENHUA
Model Number : CMC-800
Certification : CE,UL
Place of Origin : Dongguan, China
MOQ : 1 set
Price : negotiation
Payment Terms : L/C, T/T, D/P, Western Union, Paypal, Money Gram
Supply Ability : 300sets per year
Delivery Time : 30~40 days
Packaging Details : Vacuum +plywood case package, case size: 1100*1300*2250 mm(L*W*H)
Cleaning method : double fluid DI waterspray wash
Dry method : Centrifugal dry
Cleaning plate : φ<550mm
DI water supply : >17MΩ(Flow rate>7RPM)
Cleaning pressure : 3~8kg/cm2
Air filter : 1umx1pcs; 0.01umx1pcs
Machine size : L800*W960*H1800
Machine weight : 450KG
CMC-800 Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine is mainly used to clean micro dusts on camera module products such as: Wafer, CMOS, Holder...etc. By using oure DI water scan spray cleaning technology, CMC-800 wash out very little micro dusts and by using 1000RPM centrifugal dry technology, CMC-800 can quickly make products dry.
Machine Features:
1. Specially designed to clean dusts on camera module products.
2. Mirror stainless steel structure, suitable for clean room.
3. Clean plate is specially made according to products, clean plate can be changed according to different products cleaning requirement.
4. PLC control, easy operation.
5. Transparent explosion-proof front door, safe operation, convenient for observation.
6. All machine displayed by meters. Cleaning status are monitoring at the time.
7. 2 stream clean, high cleaning precise, no damage to products, very few DI water consumption.
8. Rotate spray rods, no secondary pollution.
9. Equipped with static eliminator, cleaning room heat device, help to achieve best cleaning result.
10. Equipped with 2-level air filtration system, compressed air meet the standard of ISO8573.1.
11. Compact machine, smaller foot-print.
12. Use pure DI water, comply with RoHs standard.
Machine Spec:
Cleaning Plate | Custom-made (cleaning plate diameter<550mm) | |
Clean method | 2 stream clean | |
Dry method | High speed centrifugal dry | |
Power supply | AC380V 50HZ | |
Power | 7KW | |
Power consumption | Cleaning power : 3.5kw/h | Standby power: 1kw/h |
Rotate power | 3HP | |
Environment filtration method | 0.3μm;99.999% | |
Air filtration method | 1μm×1;0.01μm×1 | |
Centrifugal rotating speed | 100-1500RPM | |
Clean pressure | Water pressure:3-8Kgf/cm² air pressure:0.2-0.5Mpa | |
DI water supply | Flow rate:>7LPM Resistivity:>17MΩ | |
Air consumption | Pressure:0.45-0.7Mpa;flow rate:>30m³/H(good cleanness) | |
DI water let in diameter | ø12mm soft hose or PT1/2″ female joint | |
Air supply diameter | ø12mm hose | |
Water exit diameter | PT 1″female joint | |
Air exit diameter | 4″×2(need air-pumping device, air speed over 3m/sec) | |
Machine size | 880mm(L)×960mm(W)×1880mm(H) | |
Machine weight | 450KG |
Machine picutre:
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Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine Images |